TY - JOUR AU - Gab, I. I. AU - Stetsyuk, T. V. AU - Shakhnin, D. B. PY - 2020/06/15 Y2 - 2024/03/29 TI - Influence of vacuum annealing on the dispersion of thin double niobium-copper films deposited onto oxide materials: Array JF - Physics and Chemistry of Solid State JA - Phys. Chem. Sol. State VL - 21 IS - 2 SE - Scientific articles DO - 10.15330/pcss.21.2.332-337 UR - https://journals.pnu.edu.ua/index.php/pcss/article/view/3588 SP - 332-337 AB - <p>The kinetics of dispersion of thin niobium-copper films deposited onto leucosapphire, alumina and zirconia ceramics and annealed in vacuum at temperatures up to 1100 °C with different exposition times at each temperature (from 5 up to 20 min) was studied. The double films consisted of two layers: the first metallization layer was 150 nm niobium nanofilm deposited onto the oxide surface, and the second copper layer 1,5 mm thick deposited over the first one as a solder was used for joining of metallized oxide samples. It was found that these films remain rather dense during heating up to 1050&nbsp;°C; and after annealing at 1100 °C they decompose into individual fragments covering about 80% the area of the ceramic substrates even after annealing during 20 min. The kinetic curves for the dispersion of these films were plotted.</p> ER -