Galvanic interconnects for thermoelectric cooling modules

Authors

  • M.M. Krechun Institute of Thermoelectricity of the NAS and MES of Ukraine; Yuriy Fedkovych Chernivtsi National University

DOI:

https://doi.org/10.15330/pcss.20.1.88

Keywords:

thermoelectric material, thermoelement legs, anti-diffusion layers, galvanic interconnects

Abstract

The paper studies the use of galvanic technologies in thermoelectricity. The technological features of applying anti-diffusion coatings on bismuth telluride based thermoelectric material (TEM) by electroplating method are considered. The advantages and disadvantages of the properties of anti-diffusion structures obtained by the electrochemical method are determined.

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Published

2019-04-01

How to Cite

Krechun, M. (2019). Galvanic interconnects for thermoelectric cooling modules. Physics and Chemistry of Solid State, 20(1), 83–88. https://doi.org/10.15330/pcss.20.1.88

Issue

Section

Review