Investigation of the conditions of synthesis of metal and chalcopyrite films from the degradation products of electrodes of an overstressed nanosecond discharge in argon and air

  • A.K. Shuaibov Uzhgorod National University
  • A.I. Minya Uzhgorod National University
  • R.V. Grytsak Uzhgorod National University
  • A.A. Malinina Uzhgorod National University
  • I.V. Shevera Uzhgorod National University
  • M.I. Vatrala Uzhgorod National University
  • Z.T. Gomoki Uzhgorod National University
Keywords: Chalcopyrite Films, Discharge, Argon, Electrodes


The characteristics of an overstressed bipolar discharge with a duration of 100-150 ns in argon and air, which was ignited between copper electrodes in argon, and also between an aluminum electrode and a chalcopyrite (CuInSe2) electrode in air, are presented. In the process of microexplosions of inhomogeneities on the working surfaces of the electrodes in a strong electric field, the vapor of copper, aluminum, and vapor of ternary chalcopyrite are introduced into the interelectrode gap. This creates the prerequisites for the synthesis of thin copper films and the synthesis of films based on quaternary chalcopyrite - CuAlInSe2, which can be deposited on a quartz plate installed near the center of the discharge gap. 
The optical characteristics of the plasma, as well as voltage pulses across the discharge gap of d = 1–2 mm, current pulses, and pulsed energy contributions to the discharge, have been investigated using emission spectroscopy with a high time resolution. The plasma emission spectra were thoroughly studied, which made it possible to establish the main decay products of the chalcopyrite molecule and the energy states of atoms and singly charged ions of aluminum, copper, and indium, which are formed in the discharge.


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How to Cite
ShuaibovA., MinyaA., GrytsakR., MalininaA., SheveraI., VatralaM., & GomokiZ. (2020). Investigation of the conditions of synthesis of metal and chalcopyrite films from the degradation products of electrodes of an overstressed nanosecond discharge in argon and air. Physics and Chemistry of Solid State, 21(4), 669-679.
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